Ehime, Japan

Atsumi Tanemura

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Nippon A&l Incorporated. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsumi Tanemura. Retrieved from https://idiyas.com/inventor/atsumi-tanemura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Atsumi Tanemura: Innovator in Adhesive Technology

Introduction

Atsumi Tanemura is a notable inventor based in Ehime, Japan. She has made significant contributions to the field of adhesive technology. Her innovative work has led to the development of a unique copolymer latex that enhances adhesive properties.

Latest Patents

Tanemura holds a patent for a copolymer latex for adhesives and adhesive composition. This copolymer latex is obtained by copolymerizing an aliphatic conjugated diene monomer with another copolymerizable monomer, an alkali metal salt of a carboxylic acid, and a divalent metal carbonate. This invention is crucial for improving the performance of adhesives in various applications.

Career Highlights

Atsumi Tanemura is associated with Nippon A&L Incorporated, where she continues to innovate in adhesive technologies. Her work has been recognized for its potential to enhance product performance in the adhesive industry.

Collaborations

Tanemura collaborates with talented individuals such as Kimio Misaki and Koichi Maki, contributing to a dynamic work environment that fosters innovation.

Conclusion

Atsumi Tanemura's contributions to adhesive technology through her patent and collaborative efforts highlight her role as a key innovator in her field. Her work continues to influence the development of advanced adhesive solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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