This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: The United States of America as Represented by the Department of Energy. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Atikur Rahman: Innovator in Superhydrophobic Surface Technologies
Introduction
Atikur Rahman is a notable inventor based in Pune, India. He has made significant contributions to the field of nanotechnology, particularly in the development of superhydrophobic surfaces. His innovative methods and systems have the potential to revolutionize various applications in materials science.
Latest Patents
Atikur Rahman holds a patent for the "Formation of superhydrophobic surfaces." This patent describes technologies for methods and systems effective for etching nanostructures in a substrate. The methods involve depositing a patterned block copolymer on the substrate and applying a precursor to generate an infiltrated block copolymer. The process includes removing polymer block domains to create a pattern of material, which masks the substrate during etching. The etching is performed under specific conditions to produce nanostructures, followed by coating the nanostructures and the substrate surface with a hydrophobic coating. He has 1 patent to his name.
Career Highlights
Throughout his career, Atikur Rahman has focused on advancing the field of nanotechnology. His work has garnered attention for its innovative approach to creating superhydrophobic surfaces, which have applications in various industries, including electronics and materials engineering.
Collaborations
Atikur has collaborated with notable researchers, including Antonio Checco and Benjamin M Ocko. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Atikur Rahman is a pioneering inventor whose work in superhydrophobic surface technologies showcases his innovative spirit and dedication to advancing nanotechnology. His contributions are expected to have a lasting impact on the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
