Iruma, Japan

Asuka Tachikawa

This inventor holds 1 USPTO granted patent. Top assignee: Olympus Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Asuka Tachikawa. Retrieved from https://idiyas.com/inventor/asuka-tachikawa-yf0xghp8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Asuka Tachikawa and High-Frequency Medical Device Innovation.

Introduction

Asuka Tachikawa is an inventor associated with Iruma, Japan, and Olympus Corporation. Her patent work concerns an electrode for a high-frequency medical device, combining a silicone-resin coating with conductive filler to support electrical conduction at the treatment section.

Latest Patents

The provided information lists one patent for Asuka Tachikawa: “Electrode for High-Frequency Medical Device and Medical Device.” The invention describes a coating film formed on at least part of a medical device’s treatment section. The film includes silicone resin and conductive filler, whose particles may be fusion-bonded to one another, or to the electrode substrate, to form a conductive path. The record provided does not specify the patent’s filing or grant date.

Career Highlights

Tachikawa’s listed patent reflects work on electrode design for high-frequency medical devices. The approach integrates a coating and conductive materials at the treatment section, with the aim of establishing a conductive path.

Collaborations

The supplied information identifies Yoshiyuki Ogawa as Tachikawa’s coworker at Olympus Corporation. No further details about their specific collaboration are provided.

Conclusion

Asuka Tachikawa’s listed invention focuses on a coated, conductive electrode for high-frequency medical devices, highlighting her contribution to medical-device innovation at Olympus Corporation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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