Suita, Japan

Asuka Hirooka

This inventor holds 1 USPTO granted patent. Top assignees: Okuno Chemical Industries Co., Ltd., Panasonic Holdings Corporation. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Asuka Hirooka. Retrieved from https://idiyas.com/inventor/asuka-hirooka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Asuka Hirooka: Innovator in Plating Film Technology

Introduction

Asuka Hirooka is a notable inventor based in Suita, Japan. He has made significant contributions to the field of plating technology, particularly with his innovative approach to plating films. His work has implications for various industries, especially those involving glass substrates.

Latest Patents

Hirooka holds a patent for a plating film and its production method. This invention provides a plating film that exhibits excellent adhesion to glass substrates. The plating film comprises an oxide layer, an electroless plating film, and an electrolytic copper plating film in that specific order. This innovative structure enhances the performance and durability of the plating film.

Career Highlights

Throughout his career, Asuka Hirooka has worked with prominent companies, including Okuno Chemical Industries Co., Ltd. and Panasonic Holdings Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in plating technology.

Collaborations

Hirooka has collaborated with talented individuals in his field, including Mayu Tsukuda and Toshimitsu Nagao. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Asuka Hirooka's contributions to plating film technology demonstrate his commitment to innovation and excellence. His patent and career achievements reflect his expertise and the impact of his work on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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