Wuppertal, Germany

Astrid Tückmantel

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Du Pont De Nmeours and Company. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Astrid Tückmantel. Retrieved from https://idiyas.com/inventor/astrid-tanduumlckmantel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Astrid Tückmantel: Innovator in Coating Technologies

Introduction

Astrid Tückmantel is a notable inventor based in Wuppertal, Germany. She has made significant contributions to the field of coating technologies, particularly in the development of innovative materials for various applications.

Latest Patents

Astrid holds a patent for a unique formulation titled "Coating of carboxyl (meth)acrylic copolymer or polyester and urea anti-sag agent prepared in polyepoxide." This invention showcases her expertise in creating advanced coatings that enhance product performance.

Career Highlights

Astrid is currently employed at E.I. du Pont de Nemours and Company, where she continues to push the boundaries of innovation in her field. Her work has been instrumental in advancing the company's product offerings and maintaining its competitive edge in the market.

Collaborations

Throughout her career, Astrid has collaborated with talented professionals, including Ralf Dahm and Carmen Flosbach. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Astrid Tückmantel's contributions to coating technologies exemplify her dedication to innovation and excellence. Her work not only enhances product performance but also sets a standard for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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