Jena, Germany

Astrid Bingel

This inventor holds 1 USPTO granted patent. Top assignee: Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Astrid Bingel. Retrieved from https://idiyas.com/inventor/astrid-bingel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Astrid Bingel: Inventor in Reflection-Reducing Layer Systems

Introduction

Astrid Bingel is an inventor associated with Jena, Germany, and Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Her work includes a patented approach to reflection-reducing layer systems that combines optical functionality with an electrically conductive surface.

Latest Patents

Bingel is credited with 1 patent: “Reflection-reducing layer system with an electrically conductive surface and method for producing a reflection-reducing layer system.” In one embodiment, the system is arranged on a substrate, with an electrically conductive surface facing away from it. A nanostructure made up of multiple side-by-side pillars lies between the substrate and the surface.

Career Highlights

The available information connects Bingel’s inventive work with Fraunhofer-Gesellschaft, a research organization focused on applied research. Her patent describes a layered structure designed to reduce reflection while providing electrical conductivity at its outer surface.

Collaborations

Bingel’s listed coworkers include Ulrike Schulz and Anne Gärtner. The provided information identifies these colleagues but does not specify their roles in the patent or their particular contributions.

Conclusion

Astrid Bingel’s recorded patent presents a reflection-reducing layer system that integrates a conductive surface and a pillar-based nanostructure, highlighting her contribution to applied materials and optical technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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