Hyderabad Telangana, India

Astitva Srivastava

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: International Institute of Information Technology, Hyderabad. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Astitva Srivastava: Innovator in 3D Garment Reconstruction

Introduction

Astitva Srivastava is a notable inventor based in Hyderabad, Telangana, India. He has made significant contributions to the field of garment modeling through his innovative patent. His work focuses on the intersection of technology and fashion, showcasing the potential of 3D modeling in the garment industry.

Latest Patents

Astitva holds a patent for a "System and method for reconstructing 3D garment model from an image." This invention provides a method for creating a three-dimensional model of a garment using a two-dimensional image. The process involves receiving a 2D image, representing the garment as a point cloud, and reconstructing a 3D image by generating a dense mesh. This method includes identifying missing regions in the point cloud and filling them using advanced techniques such as Poisson surface reconstruction.

Career Highlights

Astitva is associated with the International Institute of Information Technology, Hyderabad. His role at this prestigious institution allows him to engage in cutting-edge research and development in the field of information technology and garment modeling. His innovative approach has garnered attention in both academic and industrial circles.

Collaborations

Astitva has collaborated with talented individuals such as Snehith Routhu and Sagar Sai Jinka. These collaborations have further enriched his research and contributed to the advancement of technology in garment modeling.

Conclusion

Astitva Srivastava is a pioneering inventor whose work in 3D garment reconstruction exemplifies the fusion of technology and fashion. His innovative patent and contributions to the field highlight the potential for advancements in garment modeling.

Profile summary based on public USPTO records.
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