Ashish Neil Basuray

Title: Ashish Neil Basuray: Innovator in Nanotechnology

Introduction

Ashish Neil Basuray is a prominent inventor based in Chicago, IL (US). He has made significant contributions to the field of nanotechnology through his innovative research and patented methodologies. With a total of 2 patents, Basuray continues to push the boundaries of scientific discovery.

Latest Patents

Basuray's latest patents include groundbreaking methods for creating diazaperopyrenium dications. These methods utilize 2,3-dichloro-5,6-dicyano-1,4-benzoquinone, showcasing his expertise in chemical synthesis. Additionally, he has developed methods for generating 4,4'-bipyridinium radical cations (BIPY). This work focuses on the radical-radical interactions between BIPY radical cations, leading to the creation of novel materials for applications in nanotechnology. His research encompasses synthetic methodologies, crystallographic engineering techniques, and methods of physical characterization.

Career Highlights

Basuray is affiliated with Northwestern University, where he conducts his research and collaborates with other leading scientists in the field. His work has garnered attention for its innovative approach and potential applications in various technological domains.

Collaborations

Some of his notable coworkers include J Fraser Stoddart and Srinivasan Sampath, who have also made significant contributions to the field of nanotechnology.

Conclusion

Ashish Neil Basuray is a key figure in the advancement of nanotechnology through his innovative patents and research. His work continues to inspire future developments in the field.