Ashish Bhushan

Title: Innovations by Ashish Bhushan in Chemical Mechanical Polishing

Introduction

Ashish Bhushan is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of chemical mechanical polishing, particularly in the manufacturing of electronic devices. His innovative methods have the potential to enhance the efficiency and reliability of substrate processing.

Latest Patents

Ashish Bhushan holds a patent titled "Methods of detecting non-conforming substrate processing events during chemical mechanical polishing." This patent focuses on methods for detecting issues during the polishing process of silicon carbide substrates. The invention involves urging the substrate against a polishing pad while monitoring the temperature of the pad. If the temperature change exceeds a certain threshold, a response is initiated to address the non-conformance.

Career Highlights

Ashish Bhushan is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to apply his expertise in chemical mechanical polishing systems and processes.

Collaborations

Some of his coworkers include Jeonghoon Oh and Jamie Leighton, who contribute to the innovative environment at Applied Materials.

Conclusion

Ashish Bhushan's contributions to the field of chemical mechanical polishing demonstrate his commitment to advancing technology in electronic device manufacturing. His patent reflects a significant step forward in ensuring the quality and efficiency of substrate processing.