Livermore, CA, United States of America

Asheesh Jain

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2014-2024.

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2024

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Asheesh Jain: Innovator in Polishing Technology

Introduction

Asheesh Jain is a notable inventor based in Livermore, CA (US). He has made significant contributions to the field of polishing technology, holding 2 patents that focus on improving the efficiency and effectiveness of chemical mechanical polishing processes.

Latest Patents

One of Asheesh Jain's latest patents is titled "Polishing system apparatus and methods for defect reduction at a substrate edge." This invention includes carrier loading stations and methods designed to remove nano-scale and/or micron-scale particles that adhere to the bevel edge of a substrate before the polishing process. By eliminating these contaminants, such as loosely adhered particles of dielectric material, the invention helps prevent contamination of the polishing interface, thereby reducing scratch-related defects.

Another significant patent is the "Method for compensation of variability in chemical mechanical polishing consumables." This patent provides apparatus and methods for conditioning a polishing pad in a CMP system. The method involves performing a pre-polish process that includes urging a conditioner disk against the polishing surface of a polishing pad, moving the disk in a sweep pattern, and monitoring the rotational force required to move the disk. This data is used to adjust the polishing recipe, ensuring optimal performance during the polishing of substrates.

Career Highlights

Asheesh Jain is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on advancing polishing technologies that are critical for the manufacturing of high-quality substrates.

Collaborations

Asheesh has collaborated with several talented individuals in his field, including Sivakumar Dhandapani and Charles C Garretson. These collaborations have contributed to the development of innovative solutions in polishing technology.

Conclusion

Asheesh Jain's contributions to polishing technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovations continue to enhance the efficiency and quality of chemical mechanical polishing processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…