Plano, TX, United States of America

Asad M Hauder

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Asad M Hauder. Retrieved from https://idiyas.com/inventor/asad-m-hauder

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Asad M Hauder: Innovator in Vapor Deposition Technology

Introduction

Asad M Hauder is a notable inventor based in Plano, TX (US). He has made significant contributions to the field of integrated circuit technology. His innovative approach focuses on protecting copper interconnects, which are crucial for the performance of electronic devices.

Latest Patents

Asad holds a patent for a vapor deposition system that utilizes benzotriazole (BTA) and isopropyl alcohol. This method is designed to protect interconnects within integrated circuit structures. The patent highlights the importance of safeguarding these components to enhance the reliability and longevity of electronic devices.

Career Highlights

Asad is currently employed at Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Asad has collaborated with talented coworkers, including Arunthathi Sivasothy and Ricky A Jackson. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Asad M Hauder's contributions to vapor deposition technology exemplify the impact of innovation in the electronics industry. His work not only enhances the performance of integrated circuits but also showcases the importance of collaboration in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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