Shiga, Japan

Asaaki Yasuda

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Panasonic Corporation. Active years: 2015.


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Asaaki Yasuda: Innovator in Gas Adsorption Technology

Introduction

Asaaki Yasuda is a notable inventor based in Shiga, Japan. He has made significant contributions to the field of gas adsorption technology, particularly through his innovative designs and patents. His work is recognized for its potential applications in various industries, including energy and environmental management.

Latest Patents

Yasuda holds a patent for a gas adsorbing device and a vacuum insulation panel provided with the same. This device includes a gas adsorbing material that effectively adsorbs nitrogen. The design features a long, thin, flat, tubular housing container made of metal, which is sealed on both sides to maintain a reduced pressure environment for the gas adsorbing material. This innovative approach enhances the efficiency of gas adsorption processes.

Career Highlights

Asaaki Yasuda is associated with Panasonic Corporation, a leading company in technology and innovation. His work at Panasonic has allowed him to develop and refine his inventions, contributing to the company's reputation for cutting-edge solutions. Yasuda's patent reflects his commitment to advancing technology in practical and impactful ways.

Collaborations

Yasuda has collaborated with notable colleagues, including Shinya Kojima and Masahiro Koshiyama. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas, further enhancing the development of new technologies.

Conclusion

Asaaki Yasuda is a distinguished inventor whose work in gas adsorption technology exemplifies innovation and practical application. His contributions through patents and collaborations continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
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