Mesa, AZ, United States of America

Arvi D Jeffery

This inventor holds 1 USPTO granted patent. Top assignee: Mcdonnell Douglas Corporation. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Arvi D Jeffery: Innovator in Reflected Radiance Sensors

Introduction: Arvi D Jeffery is a notable inventor based in Mesa, AZ (US). He has made significant contributions to the field of sensor technology, particularly in the area of reflected radiance sensors. His innovative work has led to the development of a patent that enhances the accuracy of radiation detection.

Latest Patents: Arvi D Jeffery holds a patent for "Reflected radiance sensors for detection of reflected radiation." This invention involves a reflected radiance sensor that is strategically positioned in a spaced-apart relationship with a surface. The sensor's field of view intersects the surface, allowing it to detect and measure radiation reflected off that surface. The design ensures that only reflected radiation is measured, eliminating any direct incident component. The support structure for the sensor is made from materials that are transparent to the radiation wavelength band of interest, optimizing performance for specific applications. He has 1 patent to his name.

Career Highlights: Arvi D Jeffery has had a distinguished career, working with McDonnell Douglas Corporation. His role at the company has allowed him to apply his expertise in sensor technology and contribute to various projects that require advanced detection methods.

Collaborations: One of his notable collaborators is Henry B Morris. Their partnership has likely fostered innovation and development in their respective fields.

Conclusion: Arvi D Jeffery's work in reflected radiance sensors exemplifies the impact of innovative thinking in technology. His contributions continue to influence the field of radiation detection and measurement.

Profile summary based on public USPTO records.
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