Karnataka, India

Arun Kumar Kotrappa

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.9

ph-index = 1


Location History:

  • Karnataka, IN (2022)
  • Harihar, IN (2024)

Company Filing History:


Years Active: 2022-2024

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2 patents (USPTO):

Title: Innovations of Arun Kumar Kotrappa

Introduction

Arun Kumar Kotrappa is a notable inventor based in Karnataka, India. He has made significant contributions to the field of technology, particularly in substrate processing systems. With a total of 2 patents to his name, Kotrappa continues to push the boundaries of innovation.

Latest Patents

Kotrappa's latest patents include a "Hot Showerhead," which describes exemplary substrate processing systems that feature a chamber body defining a transfer region. The system includes a first lid plate seated on the chamber body, which defines a plurality of apertures. Additionally, the system incorporates multiple lid stacks, isolators, annular spacers, and manifolds to enhance its functionality. Another significant patent is the "RF Return Path for Reduction of Parasitic Plasma." This invention comprises an RF return assembly with a first plate featuring a flange, along with a second plate and bodies that work together to improve electrical coupling and performance.

Career Highlights

Arun Kumar Kotrappa is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on developing advanced technologies that contribute to the efficiency and effectiveness of substrate processing.

Collaborations

Kotrappa has collaborated with several talented individuals in his field, including Anantha K Subramani and Ramcharan Sundar. These collaborations have fostered a creative environment that encourages innovation and the development of groundbreaking technologies.

Conclusion

Arun Kumar Kotrappa's contributions to technology through his patents and work at Applied Materials, Inc. highlight his role as a significant inventor in the industry. His innovative spirit and collaborative efforts continue to inspire advancements in substrate processing systems.

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