The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2024
Filed:
Mar. 26, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Anantha K. Subramani, Sunnyvale, CA (US);
Seyyed Abdolreza Fazeli, Santa Clara, CA (US);
Yang Guo, San Mateo, CA (US);
Ramcharan Sundar, Bangalore, IN;
Arun Kumar Kotrappa, Harihar, IN;
Steven Mosbrucker, Santa Clara, CA (US);
Steven D. Marcus, San Jose, CA (US);
Xinhai Han, Santa Clara, CA (US);
Kesong Hu, Pleasanton, CA (US);
Tianyang Li, San Jose, CA (US);
Philip A. Kraus, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Exemplary substrate processing systems may include a chamber body defining a transfer region. The systems may include a first lid plate seated on the chamber body. The first lid plate may define a plurality of apertures through the first lid plate. The systems may include a plurality of lid stacks equal to a number of the plurality of apertures. The systems may define a plurality of isolators. An isolator may be positioned between each lid stack and a corresponding aperture of the plurality of apertures. The systems may include a plurality of annular spacers. An annular spacer of the plurality of annular spacers may be positioned between each isolator and a corresponding lid stack of the plurality of lids stacks. The systems may include a plurality of manifolds. A manifold may be seated within an interior of each annular spacer of the plurality of annular spacers.