Company Filing History:
Years Active: 2008
Title: Innovations of Arun K Sikder
Introduction
Arun K Sikder is a notable inventor based in Tampa, FL (US). He has made significant contributions to the field of chemical mechanical planarization, with a focus on improving methodologies and processes. His work has led to the development of innovative solutions that address existing challenges in the industry.
Latest Patents
Arun K Sikder holds 2 patents. His latest patents include a "System and method for online end point detection for use in chemical mechanical planarization." This invention presents an online methodology for end point detection that is both robust and cost-effective, overcoming some of the limitations of existing approaches. The system identifies significant events in the chemical mechanical planarization process by utilizing wavelet-based multiresolution analysis and applying a sequential probability ratio test for variance on the decomposed data.
Another notable patent is the "System and method for the identification of chemical mechanical planarization defects." This invention applies a wavelet-based multiscale method in the nanomachining process of chemical mechanical planarization during wafer fabrication. It focuses on identifying delamination defects of low-k dielectric layers by analyzing nonstationary acoustic emission signals collected during copper damascene CMP processes.
Career Highlights
Arun K Sikder is affiliated with the University of South Florida, where he continues to advance research in his field. His work has garnered attention for its innovative approaches and practical applications in the semiconductor industry.
Collaborations
Some of his notable coworkers include Rajesh Ganesan and Tapas K Das, who have collaborated with him on various projects related to his patents and research initiatives.
Conclusion
Arun K Sikder's contributions to the field of chemical mechanical planarization demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions that enhance existing processes.