The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2008
Filed:
Oct. 31, 2006
Rajesh Ganesan, Tampa, FL (US);
Tapas K. Das, Tampa, FL (US);
Arun K. Sikder, Tampa, FL (US);
Ashok Kumar, Tampa, FL (US);
Rajesh Ganesan, Tampa, FL (US);
Tapas K. Das, Tampa, FL (US);
Arun K. Sikder, Tampa, FL (US);
Ashok Kumar, Tampa, FL (US);
University of South Florida, Tampa, FL (US);
Abstract
The present invention presents a novel application of a wavelet-based multiscale method in a nanomachining process chemical mechanical planarization (CMP) of wafer fabrication. The invention involves identification of delamination defects of low-k dielectric layers by analyzing the nonstationary acoustic emission (AE) signal collected during copper damascene (Cu-low k) CMP processes. An offline strategy and a moving window-based strategy for online implementation of the wavelet monitoring approach are developed.