This inventor holds 4 USPTO granted patents. Top assignee: Micrel, Incorporated. Active years: 2003-2013.
Company Filing History:
Years Active: 2003-2013
Title: Arthur Lam: Innovator in Photomask Technology
Introduction
Arthur Lam is a notable inventor based in Fremont, California. He has made significant contributions to the field of photomask technology, holding a total of 4 patents. His work focuses on enhancing alignment accuracy in field stitching processes, which is crucial for semiconductor manufacturing.
Latest Patents
One of Arthur Lam's latest patents is titled "Single field zero mask for increased alignment accuracy in field stitching." This innovative method involves stitching a first field mask to a second field mask on a wafer. The process begins with providing a photomask that contains a first set of targets and a second set of targets. Images of these targets are printed onto the wafer, which initially has no alignment marks. The method includes forming a first set of alignment marks from the first set of targets and a second set from the second set of targets. This allows for precise alignment of both field masks, ensuring accurate stitching on the wafer.
Another patent under his name is also titled "Single field zero mask for increased alignment accuracy in field stitching." This patent describes a single field photomask that features a first set of targets on one side and a second set on the opposite side. When applied to a wafer without any alignment marks, the photomask creates alignment marks from both sets of targets. These marks are then used to align the respective field masks, facilitating the stitching of images accurately.
Career Highlights
Arthur Lam is currently employed at Micrel, Incorporated, where he continues to innovate in the field of semiconductor technology. His expertise in photomask design and alignment techniques has positioned him as a key player in advancing manufacturing processes.
Collaborations
Throughout his career, Arthur has collaborated with talented individuals such as Robert W. Rumsey and Hiu Fung Ip. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Arthur Lam's contributions to photomask technology and his innovative patents demonstrate his commitment to advancing the semiconductor manufacturing process. His work continues to influence the industry and improve alignment accuracy in field stitching.