San Francisco, CA, United States of America

Arthur K Yasuda


Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 642(Granted Patents)


Location History:

  • San Francisco, CA (US) (1987 - 1994)
  • Belmont, CA (US) (1997)

Company Filing History:


Years Active: 1987-1997

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4 patents (USPTO):

Title: Innovations of Arthur K Yasuda

Introduction

Arthur K Yasuda is a notable inventor based in San Francisco, CA. He holds a total of four patents that showcase his contributions to the field of plasma processing and chemical vapor deposition. His work has significantly impacted the semiconductor industry, particularly in improving the efficiency and quality of deposition processes.

Latest Patents

Yasuda's latest patents include a method for in situ cleaning of a vacuum plasma processing chamber. This method involves introducing water vapor and SF6 and/or NF3 gas in the presence of a plasma discharge. The reaction produces gaseous HF and acidic gases, which help in cleaning the surfaces of semiconductor oxides, metal oxides, and hydrocarbons. Another patent focuses on a reaction chamber design that minimizes particle generation in chemical vapor deposition. This design enhances the adhesion and integrity of deposited films by controlling thermal expansion and surface geometry. Additionally, he has developed an apparatus for controlling deposition quality, which includes a plasma shield and target surfaces maintained at a constant temperature.

Career Highlights

Throughout his career, Yasuda has worked with prominent companies such as Lam Research Corporation and Petrophysical Services, Inc. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and chemical vapor deposition techniques.

Collaborations

Yasuda has collaborated with notable colleagues, including James E Tappan and Dean R Denison. These collaborations have contributed to advancements in their respective fields and have fostered innovation in semiconductor processing.

Conclusion

Arthur K Yasuda's contributions to the field of plasma processing and chemical vapor deposition are significant. His innovative patents and collaborations reflect his dedication to advancing technology in the semiconductor industry. His work continues to influence the development of efficient and high-quality deposition processes.

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