Jamaica, NY, United States of America

Arthur Edelstein

This inventor holds 1 USPTO granted patent. Top assignee: Oriel Corporation. Active years: 1982.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arthur Edelstein. Retrieved from https://idiyas.com/inventor/arthur-edelstein-kbjuz7d9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1982

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1 patent (USPTO):Explore Patents

Title: Arthur Edelstein: Innovator in Precision Measurement Technology

Introduction

Arthur Edelstein is a notable inventor based in Jamaica, NY (US). He has made significant contributions to the field of precision measurement technology. His innovative approach has led to the development of a unique device that enhances the accuracy and efficiency of measuring workpiece surfaces.

Latest Patents

Edelstein holds a patent for a "Power Driven Micrometer." This invention features a power-driven mechanism designed for engaging a workpiece surface. The micrometer includes a rotatable screw and a motor that drives the screw's rotation. The design ensures that the screw and motor travel longitudinally as a unit, with the screw being threadedly engaged and supported by a nut within the micrometer casing. A key mechanism prevents the motor from rotating relative to the casing while allowing for its longitudinal movement.

Career Highlights

Arthur Edelstein is associated with Oriel Corporation, where he applies his expertise in developing advanced measurement tools. His work at the company has been instrumental in pushing the boundaries of precision engineering.

Conclusion

Arthur Edelstein's contributions to the field of precision measurement through his innovative power-driven micrometer exemplify the impact of dedicated inventors in advancing technology. His work continues to influence the industry and enhance measurement accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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