This inventor holds 1 USPTO granted patent. Top assignee: Avery Dennison Corporation. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Arnooud H Kettenis: Innovator in Multilayer Release Liners
Introduction
Arnooud H Kettenis is a notable inventor based in Alphen aan den Rijn, Netherlands. He has made significant contributions to the field of multilayer release liners, showcasing his innovative spirit and technical expertise. His work has led to the development of a unique method that enhances the functionality of release surfaces.
Latest Patents
Kettenis holds a patent for a "Method for forming multilayer release liners." This patent discloses a multilayer silicone release surface that comprises a backing, a support layer on the backing, and a silicone layer on the support layer. The various layers of this multilayer release surface are deposited substantially simultaneously, utilizing techniques such as dual die or curtain coating methods. This innovation is crucial for improving the efficiency and effectiveness of release liners in various applications.
Career Highlights
Arnooud H Kettenis is associated with Avery Dennison Corporation, a leading company in the materials science sector. His role at the company has allowed him to work on cutting-edge technologies and contribute to advancements in the industry. With a focus on innovation, Kettenis has established himself as a key player in the development of new materials.
Collaborations
Kettenis has collaborated with talented individuals such as Wen-Chen Su and Luigi Sartor. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of innovative solutions.
Conclusion
Arnooud H Kettenis is a distinguished inventor whose work in multilayer release liners has made a significant impact in the field. His innovative methods and collaborations with other experts highlight his commitment to advancing technology. His contributions continue to shape the future of materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
