Company Filing History:
Years Active: 1984-1992
Title: Arnold J Aronson: Innovator in Sputtering Technology
Introduction
Arnold J Aronson is a notable inventor based in Pomona, NY (US). He has made significant contributions to the field of materials science, particularly in the area of sputtering technology. With a total of 3 patents to his name, Aronson's work has had a considerable impact on the industry.
Latest Patents
Aronson's latest patents include a method of enhancing the performance of a magnetron sputtering target. This innovative approach involves generating a plasma confining magnetic field over the sputtering region of a target. The design allows for the critical field line to progressively flatten as the target erodes, thereby broadening the erosion groove and increasing the number of wafers coated during the target's lifespan. Another significant patent is a three-step planarization method for aluminum or aluminum alloy in via and trench features of a wafer. This method includes high-rate deposition in the absence of heat, followed by low-rate deposition with heat, and concludes with high-rate deposition while maintaining heat. This continuous and uninterrupted process ensures optimal coverage and thickness of the film.
Career Highlights
Arnold J Aronson is currently associated with Materials Research Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing sputtering techniques and improving material deposition processes.
Collaborations
Aronson has collaborated with notable colleagues such as Steven D Hurwitt and Karl J Armstrong, contributing to various projects and enhancing the collective expertise within the field.
Conclusion
Arnold J Aronson's contributions to sputtering technology and materials science are noteworthy. His innovative patents and collaborative efforts have significantly advanced the industry, showcasing his dedication to improving manufacturing processes.