Company Filing History:
Years Active: 2003
Title: Arno Hebgen: Innovator in Thin-Film Technology
Introduction
Arno Hebgen is a notable inventor based in Munich, Germany. He has made significant contributions to the field of thin-film technology, particularly through his innovative methods of production. His work focuses on the development of ultra-thin films, which have various applications in modern technology.
Latest Patents
Arno Hebgen holds a patent for a method of producing a thin-film system. This patent describes the production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm. The film is deposited using plasma-aided chemical or physical vapor-phase deposition with magnetron discharges. The method is characterized by the introduction of power output into the plasma in the form of controlled power pulses. During the deposition of the ultra-thin film, the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time.
Career Highlights
Throughout his career, Arno Hebgen has focused on advancing thin-film technologies. His innovative approaches have positioned him as a key figure in this specialized field. His patent reflects his commitment to enhancing the efficiency and effectiveness of thin-film production methods.
Collaborations
Arno has collaborated with notable colleagues, including Torsten Winkler and Ralf Blüthner. These partnerships have contributed to the development and refinement of his innovative techniques in thin-film technology.
Conclusion
Arno Hebgen's contributions to thin-film technology through his patented methods demonstrate his expertise and innovative spirit. His work continues to influence advancements in the field, showcasing the importance of innovation in modern technology.