The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Sep. 26, 2001
Torsten Winkler, Radeberg, DE;
Ralf Blüthner, Radebeul, DE;
Klaus Goedicke, Dresden, DE;
Michael Junghähnel, Dresden, DE;
Hans Buchberger, Kronberg, DE;
Manfred Müller, Essenheim, DE;
Arno Hebgen, Mendt/Dahlen, DE;
Hans-Hermann Schneider, Heidesheim, DE;
Other;
Abstract
Production of a thin-film system containing at least one ultra-thin film, preferentially in the film thickness range from 1 to 10 nm, which is deposited by plasma-aided chemical or physical vapor-phase deposition using magnetron discharges. The method is characterized in that in the course of deposition of the ultra-thin film the power output is introduced into the plasma in the form of a controlled number of power pulses and that the average power output during the pulse-on time is set higher by a factor of at least 3 than the averaged power output over the entire coating time during deposition of the ultra-thin film.