Title: Arnd Schimanski - Innovator in Substrate Technology
Introduction: Arnd Schimanski is an inventor based in Erfurt, Germany, known for his contributions to substrate technology. He currently works at Innovent e.V., where he collaborates with fellow innovators to develop advanced methods for enhancing substrate properties. Although he has not yet been granted any patents, his work is significant in the field of material science.
Latest Patent Applications: Arnd Schimanski has filed several notable patent applications, including:
1. **Method for Increasing the Translucency of a Substrate** - This application describes a method for enhancing the translucency of a substrate by depositing a scattering layer on the light exit side using chemical vapor deposition at atmospheric pressure with a plasma flame. The scattering layer may contain zinc oxide or aluminum and/or aluminum oxide, particularly aluminum-doped zinc oxide or silicon oxide.
2. **Method for Labelling a Substrate** - This invention relates to a method for labeling a substrate, where at least one luminescent dye is deposited as a first identification feature in a transparent marker layer or functional layer on the substrate's surface. The method involves creating a structure for a second identification feature through local destruction, particularly thermally, using chemical gas-phase deposition, sol-gel methods, or electrochemical techniques.
Conclusion: Arnd Schimanski's innovative approaches to substrate technology highlight his potential impact in the field, despite not having any granted patents yet. His ongoing work at Innovent e.V. and his latest patent applications demonstrate his commitment to advancing material science.