Arnd Kempa

Title: Arnd Kempa: Innovator in Fill Level Measurement Technology

Introduction

Arnd Kempa is a notable inventor based in Steinen, Germany. He has made significant contributions to the field of fill level measurement technology, holding a total of 4 patents. His work focuses on enhancing the operational reliability of measurement devices, which is crucial for various industrial applications.

Latest Patents

Kempa's latest patents include innovative methods for checking the operational reliability of radar-based fill level measurement devices. One of his patents discloses methods that involve detecting controlled variables, such as signal amplification and sampling rate. By comparing these variables with corresponding limit values, it can be determined whether the device remains operationally reliable over time. This predictive maintenance approach allows for estimating the remaining operating time until a potential functional failure occurs.

Another patent details a method for determining the serviceability of fill-level measuring devices that include electronic units. This method measures the capacitance of the energy store and the power withdrawal from it. If the capacitance falls below a defined minimum or if the power withdrawal deviates from normal consumption, the device is classified as not operationally reliable. This method not only aids in functional diagnosis but also provides predictions regarding the remaining operating time.

Career Highlights

Throughout his career, Arnd Kempa has worked with prominent companies in the industry, including Endress+Hauser GmbH & Co. KG. His experience in these organizations has allowed him to develop and refine his innovative ideas in fill level measurement technology.

Collaborations

Kempa has collaborated with notable professionals in his field, including Ghislain Daufeld and Stefan Gorenflo. These collaborations have contributed to the advancement of technology in fill level measurement.

Conclusion

Arnd Kempa's contributions to fill level measurement technology demonstrate his commitment to innovation and reliability in industrial applications. His patents reflect a deep understanding of the challenges faced in this field and provide solutions that enhance operational efficiency.