Jacarei, Brazil

Arnaldo Ferreira


 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Innovative Contributions of Inventor Arnaldo Ferreira

Introduction: Arnaldo Ferreira, an accomplished inventor based in Jacarei, Brazil, has made significant strides in the field of epoxy resins. With a keen interest in developing advanced curing agents, he holds a single patent that demonstrates his innovative approach to chemical engineering.

Latest Patents: Arnaldo Ferreira's notable patent is titled "Phenalkamine and Salted Amine Blends as Curing Agents for Epoxy Resins." This invention focuses on a curing agent for epoxy resins that consists of a phenalkamine blended with a salted polyamine or a salted polyamine-epoxy adduct. A key feature of this innovation is that at least one-third of the primary amine groups in the salted polyamine or its derivative are blocked, enhancing the performance and efficiency of epoxy resin applications.

Career Highlights: Currently, Arnaldo Ferreira is associated with Cognis IP Management GmbH, a company renowned for its focus on intellectual property management and innovative solutions in the chemical industry. His role involves leveraging his expertise in how to optimize composition formulations to advance product development in epoxy resins.

Collaborations: Throughout his career, Arnaldo has worked closely with talented colleagues like Setsuo Sato and Shailesh C. Shah. Their collaborative efforts in research and innovation have contributed to multiple advancements in their field, fostering a rich environment for creativity and scientific exploration.

Conclusion: Arnaldo Ferreira exemplifies the spirit of innovation with his patent in epoxy resin curing agents. His work at Cognis IP Management GmbH and partnerships with esteemed co-workers underscore his commitment to advancing technology in the chemical industry. As he continues to push the boundaries of innovation, his contributions will undoubtedly inspire future developments in materials science.

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