Location History:
- München, DE (2004 - 2006)
- Munich, DE (2003 - 2008)
Company Filing History:
Years Active: 2003-2008
Title: Armin Semmler: Innovator in Photolithography
Introduction
Armin Semmler is a notable inventor based in Munich, Germany. He has made significant contributions to the field of photolithography, particularly in methods that enhance the production of mask layouts. With a total of four patents to his name, Semmler's work has had a considerable impact on the semiconductor industry.
Latest Patents
One of Semmler's latest patents is a method for producing a mask layout that avoids imaging errors. This innovative approach involves creating a provisional auxiliary mask layout based on a predefined electrical circuit diagram. The provisional layout is then converted into a final mask layout using an Optical Proximity Correction (OPC) method. A key feature of this patent is the formation of a modified auxiliary mask layout that includes optically non-resolvable auxiliary structures positioned between two mask structures. This positioning is dependent on the structure sizes of the mask components, allowing for an eccentric offset when the sizes differ.
Another significant patent by Semmler focuses on a photomask and a method for structuring photoresists through double exposure. This method utilizes both a principal structure and an auxiliary structure to improve imaging quality. The imaging auxiliary structure is exposed in a second step, ensuring that only the principal structure remains on the substrate after development.
Career Highlights
Throughout his career, Armin Semmler has worked with prominent companies in the semiconductor industry, including Infineon Technologies and Qimonda. His experience in these organizations has allowed him to refine his expertise in photolithography and mask design.
Collaborations
Semmler has collaborated with notable colleagues such as Henning Haffner and Christoph Friedrich. These partnerships have contributed to the advancement of his innovative techniques and methodologies in the field.
Conclusion
Armin Semmler is a distinguished inventor whose work in photolithography has led to significant advancements in mask layout production. His innovative patents and collaborations reflect his commitment to enhancing the semiconductor industry.