This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2016-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Hofheim am Taunas, DE (2016)
- Koenigsbronn, DE (2017)
Company Filing History:
Years Active: 2016-2017
Title: Armin Rauthe-Schoech: Innovator in Microlithography
Introduction
Armin Rauthe-Schoech is a notable inventor based in Koenigsbronn, Germany. He has made significant contributions to the field of microlithography, particularly in the development of projection exposure systems. With a total of 2 patents to his name, Rauthe-Schoech continues to push the boundaries of technology in this specialized area.
Latest Patents
His latest patents include a "Projection exposure system for microlithography" and a "Method of monitoring a lateral imaging stability." The projection exposure system is designed to image mask structures into a substrate plane. It features projection optics that are configured to convert irradiated measurement radiation into at least two test waves directed onto the projection optics with differing propagation directions. Additionally, a detection diffraction element is positioned in the optical path of the test waves after they have passed through the projection optics. This element produces a detection beam from the test waves, which contains a mixture of radiation portions from both test waves. A photo detector records the radiation intensity of the detection beam in a time-resolved manner, while an evaluation unit determines the lateral imaging stability of the projection optics based on the recorded radiation intensity.
Career Highlights
Armin Rauthe-Schoech is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and microlithography. His work at this esteemed organization has allowed him to collaborate with other talented professionals in the industry.
Collaborations
Some of his notable coworkers include Matthias Manger and Ulrich Mueller, who have also contributed to advancements in microlithography and related technologies.
Conclusion
Armin Rauthe-Schoech's innovative work in microlithography and his contributions to projection exposure systems highlight his importance in the field. His patents reflect a commitment to advancing technology and improving imaging stability in optical systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile