Location History:
- Leuven, NL (2004)
- Leuven, BE (2005)
Company Filing History:
Years Active: 2004-2005
Title: Arjen Benjamin Storm: Innovator in Semiconductor Technology
Introduction
Arjen Benjamin Storm is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to substrate treatment.
Latest Patents
One of his latest patents is a method and installation for etching a substrate. This method involves treating a substrate with a mixture of hydrogen fluoride (HF) and acetic acid in a controlled manner. Acetic acid is introduced first, followed by hydrogen fluoride, which is stored in an auxiliary chamber to prevent back-flow of corrosive mixtures. This innovative approach prolongs the life of the piping assembly and prevents metal contamination on treated substrates.
Another significant patent by Storm is a method and apparatus for the thermal treatment of semiconductor substrates. In this invention, a wafer is placed in a heat treatment apparatus that consists of two flat parts. One part is heated to a high temperature while the other is cooled to below 70°C. By controlling the heat conductivity, the temperature of the wafer can be influenced, allowing it to achieve a desired thermal profile during treatment.
Career Highlights
Arjen Benjamin Storm is currently associated with ASM International N.V., a company known for its advancements in semiconductor manufacturing equipment. His work has been pivotal in enhancing the efficiency and effectiveness of substrate treatment processes.
Collaborations
Storm has collaborated with notable colleagues, including Ernst Hendrik August Granneman and Vladimir Ivanovich Kuznetsov. These collaborations have contributed to the development of innovative solutions in the semiconductor industry.
Conclusion
Arjen Benjamin Storm's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in substrate treatment methods, showcasing the importance of innovation in technology.