Rosh Haain, Israel

Ariel Ismach

USPTO Granted Patents = 2 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Ariel Ismach

Introduction

Ariel Ismach, an accomplished inventor based in Rosh Haain, IL, has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of two patents to his name, Ismach has demonstrated his expertise and creativity in designing systems that enhance gas flow and substrate handling in industrial applications.

Latest Patents

Ismach’s latest patents include a "CVD system with flange assembly for facilitating uniform and laminar flow" and a "CVD system with substrate carrier and associated mechanisms for moving substrate therethrough."

The first patent provides a detailed design of a flange assembly that effectively introduces and removes gas from a deposition chamber, featuring a series of inlet and outlet tubes for optimized flow. The second patent presents an innovative substrate carrier equipped with shelves and a motorized mechanism that allows for precise movement of substrates through the CVD system, which operates under specific pressure and temperature conditions.

Career Highlights

Throughout his career, Ismach has worked with notable organizations, including Mellanox Technologies, Ltd., and Bar-Ilan University. His work in these institutions has not only advanced his own knowledge but has also contributed to the broader field of engineering and technology.

Collaborations

Ariel Ismach has collaborated with talented professionals such as Elad Mentovich and Yaniv Rotem. These partnerships have proven fruitful in the development of innovative solutions within the technology sector, underscoring the importance of teamwork in driving advancements.

Conclusion

Ariel Ismach exemplifies the spirit of innovation and collaboration in the scientific community. With his focus on enhancing CVD systems, he continues to push the boundaries of what is possible in the field of chemical vapor deposition technology. As he progresses in his career, Ismach is likely to introduce even more groundbreaking inventions that will shape the future of the industry.

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