Kfar-Saba, Israel

Arie Kanevski

This inventor holds 1 USPTO granted patent. Top assignee: I.d.e. Technologies Ltd.. Active years: 1996.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Arie Kanevski: Innovator in Centrifugal Compressor Technology

Introduction

Arie Kanevski is a notable inventor based in Kfar-Saba, Israel. He has made significant contributions to the field of mechanical vapor compression systems, particularly through his innovative designs in centrifugal compressors.

Latest Patents

Kanevski holds a patent for a centrifugal compressor and heat pump. This invention features a lightweight, heavy-duty, large-volume centrifugal compressor designed for mechanical vapor compression systems, especially in heat pump installations. The compressor includes a shaft-driven propeller-like rotary member with a frusto-conical hub and a series of curved blades made from lightweight materials. Each blade is secured to the hub along a longitudinal curved line and extends radially. The design also incorporates a bridging membrane member that connects adjacent blades, creating curved vapor flow channels within a closely fitting shroud.

Career Highlights

Arie Kanevski is associated with I.D.E. Technologies Ltd., where he has applied his expertise in developing advanced compressor technologies. His work has been instrumental in enhancing the efficiency and performance of heat pump systems.

Collaborations

Kanevski has collaborated with notable colleagues, including Avraham Ophir and David Olomutzki. Their combined efforts have contributed to the advancement of innovative technologies in the field.

Conclusion

Arie Kanevski's contributions to centrifugal compressor technology exemplify his commitment to innovation in mechanical vapor compression systems. His patent and work at I.D.E. Technologies Ltd. highlight his role as a key figure in this specialized field.

Profile summary based on public USPTO records.
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