Kanagawa, Japan

Arata Tatsumi

USPTO Granted Patents = 8 

 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Isehara, JP (2021)
  • Kanagawa, JP (2022)
  • Yokohama, JP (2021 - 2024)

Company Filing History:


Years Active: 2021-2025

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8 patents (USPTO):Explore Patents

Title: Arata Tatsumi: Innovator in Temperature Control Technology

Introduction

Arata Tatsumi is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of temperature control technology, holding a total of 8 patents. His innovative work has paved the way for advancements in various applications.

Latest Patents

Among his latest patents is an "Apparatus and method for controlling a substrate temperature." This invention features a stage that includes a shaft, a first supporting plate over the shaft, a heater arranged in a trench formed in the first supporting plate, and a gas-supplying tube designed to blow gas to the first supporting plate. The design ensures that the gas is not released into the chamber where the stage is located. Another notable patent is "Heater and stage having the heater," which comprises a folded heater wire and multiple insulating members, enhancing the efficiency and safety of the heating process.

Career Highlights

Arata Tatsumi is currently employed at Nhk Spring Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in improving temperature control systems, which are critical in various industrial applications.

Collaborations

Throughout his career, Tatsumi has collaborated with notable colleagues, including Kenji Sekiya and Naoya Aikawa. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Arata Tatsumi's contributions to temperature control technology exemplify the impact of innovative thinking in engineering. His patents reflect a commitment to advancing the field and improving industrial processes.

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