Redmond, WA, United States of America

Apeksha Godiyal

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2016-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Apeksha Godiyal. Retrieved from https://idiyas.com/inventor/apeksha-godiyal

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 2

Forward Citations = 42(Granted Patents)


Location History:

  • Bellevue, WA (US) (2016 - 2018)
  • Redmond, WA (US) (2019 - 2020)

Company Filing History:


Years Active: 2016-2020

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4 patents (USPTO):Explore Patents

Title: Inventor Apeksha Godiyal - Revolutionizing Technology

Introduction: Apeksha Godiyal, a visionary inventor based in Redmond, WA, is making waves in the tech industry with her groundbreaking innovations and forward-thinking approach.

Latest Patents: Apeksha Godiyal holds several patents in the field of artificial intelligence and machine learning, with her most recent patent focusing on enhancing cybersecurity measures through advanced algorithms.

Career Highlights: With a background in computer science and engineering, Apeksha has worked for top tech companies, contributing significantly to the development of cutting-edge technologies that have shaped the industry.

Collaborations: Apeksha Godiyal has collaborated with leading research institutions and universities to further her research and bring her innovative ideas to life. Her collaborative efforts have resulted in the creation of revolutionary products that have garnered international acclaim.

Conclusion: Apeksha Godiyal's passion for innovation and dedication to pushing the boundaries of technology have solidified her position as a trailblazing inventor in the ever-evolving tech landscape. Her relentless pursuit of excellence continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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