This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Mas Innovation Limited. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Anushka Darshana: Innovator in Textile Fabric-Elastomer Composites
Introduction
Anushka Darshana is a prominent inventor based in Battaramulla, Sri Lanka. She has made significant contributions to the field of material science, particularly in the development of innovative composite materials. Her work focuses on enhancing the properties of textiles through the integration of elastomeric materials.
Latest Patents
Anushka holds a patent for a unique textile fabric-elastomer composite. This composite material is formed from a textile substrate made from a yarn, which consists of a plurality of fibers or filaments. The yarn features a core region surrounded by a peripheral region of fibers or filaments. A cured elastomeric material layer is applied over the textile substrate surface, allowing it to penetrate into the yarn and bond with the fibers in the peripheral region. This innovative approach enhances the functionality and durability of textile products.
Career Highlights
Anushka is currently employed at Mas Innovation (Private) Limited, where she continues to explore new avenues in textile innovation. Her dedication to research and development has positioned her as a key player in her field. With her expertise, she aims to push the boundaries of what is possible in textile technology.
Collaborations
Anushka collaborates with talented individuals such as Achala Sajeeva Satharasinghe and Madushi Hansika Medagedara. Together, they work on various projects that aim to advance the field of textile composites.
Conclusion
Anushka Darshana is a trailblazer in the realm of textile fabric-elastomer composites. Her innovative patent and collaborative efforts highlight her commitment to advancing material science. Through her work, she continues to inspire future generations of inventors and researchers.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile