Seoul, South Korea

Anurag Srivastava

This inventor holds 2 USPTO granted patents. Top assignees: Samsung Electronics Co., Ltd., Seoul National University. Active years: 2012-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anurag Srivastava. Retrieved from https://idiyas.com/inventor/anurag-srivastava-ymhok8dn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2012-2014

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2 patents (USPTO):Explore Patents

Title: Anurag Srivastava: Innovator in Electron Beam Technology

Introduction

Anurag Srivastava is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of electron beam technology, holding 2 patents that showcase his innovative approach to enhancing electron gun performance.

Latest Patents

His latest patents include the development of an electron beam focusing electrode and an electron gun utilizing this technology. The electron beam focusing electrode features a plate with a polygonal through-hole and at least one projecting portion formed on one side of the through-hole. This design effectively reduces the spreading phenomenon of an electron beam with a rectangular cross-section. As a result, the output of the electron gun is increased, allowing for easier focusing of electron beams.

Career Highlights

Anurag has worked with prominent organizations such as Samsung Electronics Co., Ltd. and Seoul National University. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in his field.

Collaborations

Some of his notable coworkers include Chan Wook Baik and Jong Min Kim, who have collaborated with him on various projects.

Conclusion

Anurag Srivastava's work in electron beam technology exemplifies his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving electron gun efficiency and performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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