Anupama Mukherjee

Title: Anupama Mukherjee: Innovator in Photoresist Technology

Introduction

Anupama Mukherjee is a notable inventor based in Woodbridge, NJ (US). She has made significant contributions to the field of photoresist technology, particularly with her innovative formulations that enhance the capabilities of photoresist compositions.

Latest Patents

Anupama Mukherjee holds 1 patent for her invention titled "Negative resist formulation for producing undercut pattern profiles." This negative-acting photoresist composition is imageable by 365 nm radiation and is developable in aqueous base. The composition includes an aqueous base soluble phenolic film-forming polymeric binder resin with ring bonded hydroxyl groups, a photoacid generator, a crosslinking agent comprising an etherified melamine, a dye, and a quencher system consisting of an amine quencher or a mixture of such amine quenchers. This invention also pertains to processes of using this composition as a photoresist.

Career Highlights

Anupama Mukherjee is currently associated with Merck Patent GmbH, where she continues to advance her research and development efforts in the field of photoresist technology. Her work has been instrumental in improving the performance and application of photoresist materials in various industries.

Collaborations

Anupama has collaborated with Medhat A Toukhy, contributing to the development of innovative solutions in her field.

Conclusion

Anupama Mukherjee's contributions to photoresist technology exemplify her dedication to innovation and excellence. Her work continues to influence the industry and pave the way for future advancements.