This inventor holds 1 USPTO granted patent. Top assignee: Koninklijke Philips Corporation N.v.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Innovations of Antonius A M Van De Vorst
Introduction
Antonius A M Van De Vorst is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of etching methods, particularly in the context of material reduction on substrates. His innovative approach has led to the development of a unique patent that enhances the precision of etching processes.
Latest Patents
Antonius holds a patent for an etching method that involves reducing the thickness of a material layer on a substrate. This method utilizes monitoring means to determine the depth of material that has been etched away. The process includes a resonant crystal that measures changes in mass as the reference material is etched, allowing for precise control over the etching duration. This innovative technique ensures that the exposure to the etchant is interrupted at the desired thickness, enhancing the efficiency and accuracy of the etching process. He has 1 patent to his name.
Career Highlights
Antonius A M Van De Vorst is associated with Koninklijke Philips Corporation N.V., a leading company in technology and innovation. His work at Philips has allowed him to explore advanced methodologies in material processing, contributing to the company's reputation for cutting-edge research and development.
Collaborations
Antonius has collaborated with Dirk Maarten Knotter, working together to advance their research and innovations in the field of etching methods. Their partnership has fostered a productive environment for developing new technologies.
Conclusion
Antonius A M Van De Vorst is a distinguished inventor whose work in etching methods has made a significant impact in the field. His innovative patent reflects his commitment to advancing technology and improving processes in material science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
