Zaragoza, Spain

Antonio Miguel Artiaga

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Cirrus Logic International Semiconductor Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Antonio Miguel Artiaga. Retrieved from https://idiyas.com/inventor/antonio-miguel-artiaga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Antonio Miguel Artiaga: Innovator in Speaker Recognition Technology

Introduction

Antonio Miguel Artiaga is a notable inventor based in Zaragoza, Spain. He has made significant contributions to the field of speaker recognition technology. His innovative approach has led to the development of a unique method that enhances the accuracy of speaker identification.

Latest Patents

Antonio holds a patent for a method of text-dependent speaker recognition. This method utilizes a speaker-adapted Universal Background Model, which is a speaker-adapted Hidden Markov Model that includes channel correction. This advancement is crucial for improving the reliability of speaker recognition systems.

Career Highlights

Throughout his career, Antonio has worked with prominent companies in the technology sector. He has been associated with Cirrus Logic International Semiconductor Limited and Agnitio, where he contributed to various projects that focused on audio and speech processing technologies.

Collaborations

Antonio has collaborated with talented individuals in his field, including Luis Buera Rodriguez and Carlos Vaquero Aviles-Casco. These partnerships have fostered innovation and have been instrumental in the development of advanced speaker recognition solutions.

Conclusion

Antonio Miguel Artiaga's work in speaker recognition technology exemplifies his commitment to innovation and excellence. His contributions continue to influence the industry and pave the way for future advancements in this critical area of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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