Grandvaux, Switzerland

Antonio Longo

This inventor holds 2 USPTO granted patents. Top assignee: Bobst Sa. Active years: 2010-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Antonio Longo. Retrieved from https://idiyas.com/inventor/antonio-longo-4eo3sea0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 24(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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2 patents (USPTO):Explore Patents

Title: Antonio Longo - Innovator in Platen Press Technology

Introduction

Antonio Longo is a notable inventor based in Grandvaux, Switzerland. He has made significant contributions to the field of platen press technology, holding two patents to his name. His work is recognized for its innovation and practical applications in the industry.

Latest Patents

Antonio Longo's latest patents include advancements in platen press technology. These patents reflect his commitment to improving the efficiency and effectiveness of printing processes. His inventions are designed to meet the evolving needs of the printing industry.

Career Highlights

Antonio Longo is currently employed at Bobst SA, a leading company in the printing and packaging sector. His role at Bobst SA allows him to apply his inventive skills and contribute to the development of cutting-edge technologies. His work has garnered respect and recognition within the industry.

Collaborations

Antonio collaborates with Christophe Kosciolek, a fellow innovator. Together, they work on projects that push the boundaries of technology in their field. Their partnership exemplifies the spirit of teamwork and innovation.

Conclusion

Antonio Longo is a distinguished inventor whose work in platen press technology has made a significant impact. His patents and career at Bobst SA highlight his dedication to innovation and excellence in the printing industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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