Location History:
- Rome, IT (1984 - 1989)
- Monteporzio, IT (1992)
Company Filing History:
Years Active: 1984-1992
Title: The Innovative Mind of Antonio Cetronio
Antonio Cetronio, an accomplished inventor based in Rome, Italy, has made significant strides in the field of semiconductor technology. With a portfolio of four patents, his inventive prowess has contributed to advancements in the design and manufacturing of MESFET (Metal-Semiconductor Field-Effect Transistor) devices.
Latest Patents
Among his latest patents is a groundbreaking innovation titled "Multi-layer photopolymeric structure for the manufacturing of MESFET." This technique employs conventional photolithography to fabricate Gallium Arsenide (GaAs) MESFET devices with sub-micrometric gates and adjustable recessed channel lengths. The design consists of two photopolymeric layers that are strategically separated by a metal interface. The superior stencil layer establishes the aperture of the submicrometric gate, while the lower planarizing layer delineates the recessed channel, which is framed by the metal interface acting as a template. Remarkably, this multilayer structure design allows for gate lengths of approximately 0.1 μm, with recessed channel lengths ranging from 0.8 to 3 μm, and typically yields a process success rate better than 90%. In addition, by incorporating a thicker planarizing layer, a substantial metal deposit of around 0.8 μm can be attained, utilizing a Ti/Pt/Au overlayer over ohmic contacts and gate pads.
Another notable patent focuses on a "Photolithographic method of aligning a structure on the back of a substrate." This innovative method facilitates the development of semiconductive devices, particularly MESFETs. It employs a template bonded to a previously circuit-element-formed substrate surface, allowing for precise alignment. After this initial step, the rear surface is coated with a resist, and a second template, externally aligned using markings outside the substrate, is employed. This results in the creation of a structure that may include through-holes for metal deposits that extend through the GaAs substrate.
Career Highlights
Antonio Cetronio has worked with several notable companies during his career, including Selenia Industrie Elettroniche Associate S.p.a. and Selenia Industrie Elettroniche Associate. His contributions in these roles have propelled advancements in the electronics sector, especially in semiconductor technologies.
Collaborations
Throughout his professional journey, Cetronio has collaborated with esteemed colleagues such as Sergio Moretti and Maurizio Di Bona. Their joint efforts reflect a commitment to pushing the boundaries of innovation in their respective fields.
Conclusion
Antonio Cetronio's inventive spirit and dedication to advancing semiconductor technology mark him as a significant figure in the industry. His patents not only demonstrate technical expertise but also a visionary approach to solving complex challenges in electronics manufacturing. As he continues to innovate, the impact of his work will undoubtedly resonate within the technological landscape for years to come.