Bernalda, Italy

Antonino Cucinella

This inventor holds 1 USPTO granted patent. Top assignee: Nyltech Italia. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Antonino Cucinella. Retrieved from https://idiyas.com/inventor/antonino-cucinella

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Antonino Cucinella: Innovator in Polyamide Manufacturing

Introduction

Antonino Cucinella is a notable inventor based in Bernalda, Italy. He has made significant contributions to the field of materials science, particularly in the development of polyamide. His innovative approach has led to advancements in manufacturing processes that are essential for various applications.

Latest Patents

Cucinella holds a patent for a method of manufacturing polyamide and compounds containing it. This patent represents a crucial step forward in the production of high-performance materials that are widely used in different industries.

Career Highlights

Cucinella is associated with Nyltech Italia, a company that specializes in the production of advanced polymer materials. His work at Nyltech Italia has allowed him to apply his expertise in polyamide manufacturing, contributing to the company's reputation for innovation and quality.

Collaborations

Throughout his career, Cucinella has collaborated with talented individuals such as Giuseppe Di Silvestro and Cesare Guaita. These partnerships have fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Antonino Cucinella's contributions to polyamide manufacturing highlight his role as an influential inventor in the materials science sector. His innovative methods and collaborations continue to shape the future of polymer technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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