Frammersbach, Germany

Anton Scherer




Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2002-2009

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4 patents (USPTO):Explore Patents

Title: Anton Scherer: Innovating Contact Lens Care in Frammersbach, Germany

Introduction

Anton Scherer, an inventive mind from Frammersbach, Germany, has made significant contributions to the field of contact lens care. With a total of four patents to his name, Scherer’s work primarily focuses on enhancing the user experience for contact lens wearers through innovative chemical formulations.

Latest Patents

Among his latest patents is a notable invention related to a lens care product containing dexpanthenol. This invention describes a contact lens care product that comprises dexpanthenol, which is recognized for its moisturizing and soothing properties. Furthermore, it addresses the usage of such compositions for cleaning and optionally disinfecting contact lenses, thus improving both hygiene and comfort for users.

Career Highlights

Scherer is currently associated with Novartis AG, a global healthcare company known for its commitment to research and innovation. His role within the company has allowed him to focus on the development of advanced care solutions for contact lenses, making a lasting impact on the industry.

Collaborations

Working alongside distinguished colleagues such as Peter Schwind and Klaus Oswald, Scherer has been a vital part of a team that emphasizes collaborative effort and shared expertise in the pursuit of technological advancements in eye care.

Conclusion

Anton Scherer’s innovative contributions to contact lens care underscore the importance of research and development in everyday health products. His work not only enhances the quality of life for contact lens users but also exemplifies how targeted innovations can lead to substantial improvements in user experience. With his ongoing efforts at Novartis AG, the future looks promising for his further contributions to the field.

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