Company Filing History:
Years Active: 2005
Title: Anton Schatzeder: Innovator in Epitaxy Reactor Technology
Introduction
Anton Schatzeder is a notable inventor based in Schnaitsee, Germany. He has made significant contributions to the field of epitaxy reactor technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of processes within epitaxy reactors.
Latest Patents
Anton Schatzeder holds a patent for a "Method and device for regulating the differential pressure in epitaxy reactors." This invention involves a method and device designed to regulate pressure within an epitaxy reactor. The reactor consists of a wafer handling chamber (WHC), a process chamber (PC), and a gate valve (GV) that connects the two chambers. The WHC is continuously purged with inert gas, and the pressure difference between the two chambers is measured. This measurement is utilized in a control circuit to adjust the pressure in the wafer handling chamber. If the pressure difference exceeds a predetermined value, the pressure in the WHC is reduced. Conversely, if the pressure difference falls below a predetermined value, the pressure in the WHC is increased. The predetermined pressure difference is defined as being between 5 and 500 PA. Each chamber is equipped with gas discharge and input lines, along with a differential pressure sensor and a control unit for pressure regulation.
Career Highlights
Anton Schatzeder is currently employed at Siltronic AG, a leading company in the semiconductor industry. His role involves working on advanced technologies that contribute to the development of high-quality silicon wafers. His expertise in pressure regulation within epitaxy reactors has positioned him as a key figure in his field.
Collaborations
Anton collaborates with Georg Brenninger, a fellow professional in the industry. Their combined efforts contribute to the advancement of technologies related to epitaxy reactors.
Conclusion
Anton Schatzeder's innovative work in regulating differential pressure in epitaxy reactors showcases his commitment to advancing semiconductor technology. His contributions are vital to improving the efficiency of processes in this critical industry.