Lauf, Germany

Anton Politzer

This inventor holds 1 USPTO granted patent. Top assignee: Firma Diehl. Active years: 1984.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anton Politzer. Retrieved from https://idiyas.com/inventor/anton-politzer-w1vxdti1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1984

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1 patent (USPTO):Explore Patents

Title: Anton Politzer: Innovator in Armored Vehicle Technology

Introduction

Anton Politzer is a notable inventor based in Lauf/Pegn., Germany. He has made significant contributions to the field of armored vehicle technology, particularly with his innovative designs that enhance operational efficiency and safety.

Latest Patents

Politzer holds a patent for an "Arrangement for a mortar in an armored vehicle." This invention features a gun laying device and includes a ball bearing support for the mortar, which is mounted on a traverse within the vehicle. This design allows for the axial displacement of the mortar, facilitating breech-loading of munitions of varying sizes while ensuring the protection of the vehicle's interior.

Career Highlights

Anton Politzer is associated with Firma Diehl, where he applies his expertise in developing advanced military technologies. His work has been instrumental in improving the functionality and safety of armored vehicles.

Collaborations

Politzer collaborates with Wilhelm Machmer, contributing to the innovative projects at Firma Diehl. Their combined efforts have led to advancements in military vehicle design and functionality.

Conclusion

Anton Politzer's contributions to armored vehicle technology through his patent and work at Firma Diehl highlight his role as an influential inventor in the field. His innovations continue to shape the future of military technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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