Antoine Pacco

Title: The Innovations of Antoine Pacco

Introduction

Antoine Pacco is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of materials science, particularly in the area of crystalline silicon etching. His innovative approach has led to the development of a unique patent that enhances the control over the etching process of silicon nanostructures.

Latest Patents

Antoine Pacco holds a patent titled "System and method for controlling directionality of fast-wet etching of crystalline silicon, c-Si." This patent describes a system and method for selectively switching the fast-wet-etching direction of crystalline silicon nanostructures between the different crystallographic planes of c-Si. By employing a simple method of sample agitation, this invention effectively achieves both anisotropic and isotropic wet-etching of c-Si.

Career Highlights

Throughout his career, Antoine has worked with prestigious institutions such as the National University of Singapore and the Agency for Science, Technology and Research. His work has been instrumental in advancing the understanding and application of etching techniques in silicon-based technologies.

Collaborations

Antoine has collaborated with notable colleagues, including Utkur Mirsaidov and Michel Bosman. These partnerships have contributed to the development of innovative solutions in the field of materials science.

Conclusion

Antoine Pacco's contributions to the field of crystalline silicon etching demonstrate his innovative spirit and dedication to advancing technology. His patent reflects a significant step forward in the control of etching processes, showcasing the potential for further advancements in materials science.