NZ

Anthony Warren Mcmurtrie Bainbridge

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anthony Warren Mcmurtrie Bainbridge. Retrieved from https://idiyas.com/inventor/anthony-warren-mcmurtrie-bainbridge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Title: Anthony Warren McMurtrie Bainbridge: Innovator in Multi-Layer Films

Introduction

Anthony Warren McMurtrie Bainbridge is an inventor based in New Zealand, known for his work in the field of multi-layer heat shrinkable films. His innovative approach has led to the development of a unique film structure that enhances durability and resistance to abuse. Although he holds no patents, his contributions to the industry are noteworthy.

Latest Patents

Anthony's notable invention is a multi-layer heat shrinkable film that consists of at least three layers. The outer layer is a blend of EVA and VLDPE, while the other outer layer is either VLDPE or a blend of VLDPE and EVA. The internal layer is primarily EVA. This innovative film design provides excellent resistance to various forms of abuse. The invention also includes a method of treatment for the film and a container or package that incorporates this advanced film technology.

Career Highlights

Throughout his career, Anthony has worked with various companies, including Anthony Warren McMurtrie and Anthony Warren McMurtrie Bainbridge. His expertise in film technology has positioned him as a valuable contributor to the field.

Collaborations

Anthony has collaborated with notable individuals such as Alan Gordon Stewart, further enhancing his innovative projects and contributions to the industry.

Conclusion

Anthony Warren McMurtrie Bainbridge is a significant figure in the development of multi-layer films, showcasing his innovative spirit and dedication to advancing film technology. His work continues to influence the industry, despite the absence of patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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