Anthony R Keane

Title: The Innovative Mind of Anthony R. Keane

Introduction

Anthony R. Keane, an inventive spirit hailing from Webster, NY, has made significant contributions to the field of radio frequency technology through his innovative designs. With a total of six patents to his name, his work showcases a deep understanding of advanced electrical engineering concepts.

Latest Patents

Among his most notable patents is the "Aliasing Sampler for Plasma Probe Detection." This invention addresses the challenges of detecting plasma RF voltage and current by employing an aliasing sampler probe. The design utilizes a sampling signal with a rate slower than the RF fundamental frequency, resulting in an aliasing frequency that is orders of magnitude below the fundamental frequency. Notably, with RF power applied at 13.56 MHz and a sampling pulse rate of 2.732 MHz, this innovation produces replicas of RF voltage and current waveforms at approximately 100 KHz. This methodology preserves phase and harmonic information with a level of accuracy unmatched by other sampling techniques.

Another significant patent is the "Active Bias for a Pulsed Power Amplifier," which involves a high-power radio-frequency amplifier functioning on periodic pulses of RF energy. In this design, the bias is deftly controlled for each bank of FETs or other amplifier devices that comprise the main power stage. The invention ensures optimal performance by measuring quiescent drain current during a blanking period and adjusting bias levels accordingly. A timing control circuit governs the sample and hold mechanism, ensuring that biasing circuits receive precise signals. Furthermore, this system includes a thermal sensor that pre-sets the operating voltage when the operation has been interrupted, highlighting its sophisticated engineering.

Career Highlights

Anthony has been instrumental in the development of various pivotal technologies during his career. He has worked with Astec America, Inc. and Eni Division of Astec America, Inc., where he honed his skills and made valuable contributions to the field.

Collaborations

Throughout his professional journey, Anthony has collaborated with talented individuals, including Bart C. Vandebroek and Steven E. Hauer. These partnerships have further enriched his work and provided significant insights into innovative engineering practices.

Conclusion

Anthony R. Keane's contributions to the field of RF technology with his inventive solutions and patents reflect a profound dedication to engineering excellence. His work not only advances the capabilities of RF systems but also serves as an inspiration for future innovators in the field. As technology continues to evolve, the impact of Anthony's innovations will likely resonate for years to come.