Location History:
- Wappingers Falls, NY (US) (1980)
- Cary, NC (US) (1984)
Company Filing History:
Years Active: 1980-1984
Title: The Innovations of Anthony J Hoeg, Jr.
Introduction
Anthony J Hoeg, Jr. is a notable inventor based in Wappingers Falls, NY. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative spirit and technical expertise. His work primarily focuses on processes that enhance the functionality and efficiency of integrated circuits.
Latest Patents
Hoeg's latest patents include a "Process for fabricating semi-conductive oxide between two poly silicon" and a "Method of forming thin film interconnection systems." The first patent describes a process for placing non-continuous Dual Electron Injection Structures (DEIS) between two layers of polysilicon, which are essential for forming an array of poly devices on an integrated circuit substrate. This innovative approach utilizes separate masks to define Poly 1 and Poly 2 devices, ensuring precision in the fabrication process. The DEIS structure is strategically positioned above the poly 1 devices, with a silicon nitride layer masking it to prevent oxidation during processing. Additionally, a thin layer of poly x is introduced to protect the DEIS during etching steps.
The second patent outlines a method for forming thin film interconnection patterns atop semiconductor substrates. This method employs the passivation layer, typically glass, as a stable masking material for etching conductive lines. Conversely, the metal conductor serves as a stable mask for etching the glass to create via holes. This process offers a practical resist system that is compatible with reactive ion etching and other dry etching techniques.
Career Highlights
Hoeg is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of semiconductor technology. His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements that have a lasting impact on technology.
Collaborations
Some of his notable coworkers include Kenneth Chang and David C Cosman. Their collaborative efforts have fostered an environment of innovation and creativity, leading to groundbreaking developments in their field.
Conclusion
Anthony J Hoeg, Jr. exemplifies the spirit of innovation through his patents and contributions to semiconductor technology. His work at IBM and collaborations with esteemed colleagues highlight his commitment to advancing the industry. His inventions continue to influence the future of integrated circuits and semiconductor applications.