US

Anthony J Deruyter

This inventor holds 0 USPTO granted patents, plus 1 CIPO patent.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anthony J Deruyter. Retrieved from https://idiyas.com/inventor/anthony-j-deruyter

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Title: Innovations by Anthony J Deruyter

Introduction

Anthony J Deruyter is an inventor based in the United States, known for his contributions to laser technology. His work focuses on improving the efficiency and effectiveness of lasers used in various applications, including photolithography and medical surgery.

Latest Patents

One of his notable patents is titled "Laser Having Baffled Enclosures." This invention discloses a laser that includes a discharge chamber and heat-generating electronics enclosed in a baffled enclosure. This design requires less cooling air to reliably cool the components compared to previous unbaffled enclosures. The patent also describes a method for reducing the amount of conditioned air needed for cooling. Additionally, the laser features a heat-exchange system that quickly responds to changes in laser gas temperature by adjusting a flow-proportioning valve. This innovation ensures a continuously variable rate of heat exchange, maintaining a constant lasing gas temperature.

Career Highlights

Throughout his career, Anthony J Deruyter has worked with various companies, including Tom A. Watson and International Business Machines Corporation (IBM). His experience in these organizations has contributed to his expertise in laser technology and innovation.

Collaborations

One of his notable coworkers is William N Partlo, with whom he has collaborated on various projects related to laser technology.

Conclusion

Anthony J Deruyter's work in laser technology showcases his innovative spirit and dedication to improving the efficiency of lasers in critical applications. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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